High-k Gate Dielectrics for CMOS Technology

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High-k Gate Dielectrics for CMOS Technology is written by Gang He and published by John Wiley & Sons. It's available with International Standard Book Number or ISBN identification 3527646361 (ISBN 10) and 9783527646364 (ISBN 13).

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.