* Price may vary from time to time.
* GO = We're not able to fetch the price (please check manually visiting the website).
Atomic Layer Deposition Applications 6 is written by J. W. Elam and published by The Electrochemical Society. It's available with International Standard Book Number or ISBN identification 1566778212 (ISBN 10) and 9781566778213 (ISBN 13).
The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the focus of this reoccurring symposium. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topographies with controlled thickness and composition. This issue of ECS Transactions contains peer reviewed papers presented at the symposium. A broad spectrum of ALD applications is featured, including novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics, and a variety of other emerging applications.