Atomic Layer Deposition Applications 4

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Atomic Layer Deposition Applications 4 is written by Ana Londergan and published by The Electrochemical Society. It's available with International Standard Book Number or ISBN identification 1566776503 (ISBN 10) and 9781566776509 (ISBN 13).

The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the symposium focus. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties. This issue of the ECS Transactions contains peer reviewed papers presented at the symposium. Breadths of ALD Applications are featured: novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics and a variety of other emerging applications.