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Atomic Layer Deposition Applications 2 is written by Ana Londergan and published by The Electrochemical Society. It's available with International Standard Book Number or ISBN identification 1566775426 (ISBN 10) and 9781566775427 (ISBN 13).
This issue gives an overview of the cutting edge research in the various areas where Atomic Layer Deposition (ALD) can be used, enabling the identification of issues, challenges, and areas where further research is needed. Contributions include: Memory applications, Interconnects and contacts, ALD Productivity enhancement and precursor development, ALD for optical and photonic applications, and Applications in other areas, such as MEMs, nanotechnology, fabrication of sensors and catalysts, etc.