Ion Implantation Technology
- Edmund G. Seebauer
- Susan B. Felch
- Amitabh Jain
- Yevgeniy V. Kondratenko
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Know about the book -
Ion Implantation Technology is written by Edmund G. Seebauer and published by American Institute of Physics. It's available with International Standard Book Number or ISBN identification 0735405972 (ISBN 10) and 9780735405974 (ISBN 13).
The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing).
