Ion Impantation Technology

Know about the book -

Ion Impantation Technology is written by Karen J. Kirkby and published by American Institute of Physics. It's available with International Standard Book Number or ISBN identification 0735403651 (ISBN 10) and 9780735403659 (ISBN 13).

This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.