Ion Implantation Science and Technology

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Ion Implantation Science and Technology is written by J.F. Ziegler and published by Elsevier. It's available with International Standard Book Number or ISBN identification 0323144012 (ISBN 10) and 9780323144018 (ISBN 13).

Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.